引用本文:林志贤,郭太良.场致发射材料的特性[J].福州大学学报(自然科学版),2000,(4):22~25 |
场致发射材料的特性 |
The characteristics of field emission materials |
修订日期:1999-11-02 |
DOI:10.7631/issn.1000-2243.2000.4.22 |
中文关键词: 场致发射材料,阴极,制备工艺,特性 |
英文关键词: field emission material,cathode,fabrication technology,characteristics |
基金项目:福建省自然科学基金资助项目!(F96024) |
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中文摘要: |
主要论述了场致发射材料及其特性 ,对金属、硅微尖、金刚石薄膜、GaAs等的制备工艺和阴极特性作了较为详细的分析 .介绍了这些材料在新型场致发射显示器件 (FED)、真空微电子管作为阴极材料的应用 ,并对场致发射材料的获得和改进进行了初步的探讨 |
英文摘要: |
In this paper some field emission materials and their characteristics are discussed. These materials include metals, silicon tips, diamond-films, GaAs etc. Their fabrication technology and cathode characteristics are analyzed in detail. Then we introduce the application of these materials in a new type FED and as cathodes in vacuum micro-electronic tubes. Finally, in summarizing some experience, we discuss the obtainment and improvement of field emission materials. |
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